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TiSix as a new embedded materi...
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TiSix as a new embedded material for attenuated phase shift mask
Manylion Llyfryddiaeth
Prif Awduron:
Loong, W
,
Chen, T
,
Shy, S
,
Tseng, J
,
Lin, R
Fformat:
Conference item
Cyhoeddwyd:
1996
Daliadau
Disgrifiad
Eitemau Tebyg
Dangos Staff
Eitemau Tebyg
Application of phase shift masking to sub-0.13 micron lithography
gan: Koo, Chee Kiong.
Cyhoeddwyd: (2008)
Application of phase shift masking to sub-micron contact level lithography
gan: Choo, Lay Cheng.
Cyhoeddwyd: (2008)
Proximal Algorithms for Discrete-Level Phase-Shifting Mask Design with Application to Optogenetics
gan: Dimitris Ampeliotis, et al.
Cyhoeddwyd: (2021-10-01)
Phase shift, amplification, oscillation and attenuation of solitons in nonlinear optics
gan: Weitian Yu, et al.
Cyhoeddwyd: (2019-01-01)
Acoustic Attenuation of COVID-19 Face Masks: Correlation to Fibrous Material Porosity, Mask Breathability and Bacterial Filtration Efficiency
gan: Milena Martarelli, et al.
Cyhoeddwyd: (2022-02-01)