GROWTH AND MBMS STUDIES OF REACTION-MECHANISMS FOR INXGA1-XAS CBE

The reaction mechanism involved in the growth of InxGa1-xAs lattice matched to InP by chemical beam epitaxy (CBE) was investigated using growth and modulated beam mass spectrometry studies. Emphasis was placed on elucidating how variations in substrate temperature, indium composition and arsenic ove...

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Main Authors: Singh, N, Foord, J, Skevington, P, Davies, G
Format: Conference item
Published: 1992
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author Singh, N
Foord, J
Skevington, P
Davies, G
author_facet Singh, N
Foord, J
Skevington, P
Davies, G
author_sort Singh, N
collection OXFORD
description The reaction mechanism involved in the growth of InxGa1-xAs lattice matched to InP by chemical beam epitaxy (CBE) was investigated using growth and modulated beam mass spectrometry studies. Emphasis was placed on elucidating how variations in substrate temperature, indium composition and arsenic overpressure influence growth kinetics and how sensitive changes in experimental conditions bring about deviations in the ideal stoichiometry (In0.53Ga0.47As) required for lattice matching to InP. Our observations indicate that the compositional variations in the InGaAs stoichiometry at high temperatures (> 485°C) arise because of the changes in the DEG decomposition: desorption branching ratio which is controlled by a temperature- and arsenic pressure-dependent surface population of indium atoms. The low temperature behaviour is governed by the availability of metal surface sites for triethylgallium decomposition which is increased by the presence of surface indium atoms. © 1992.
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spelling oxford-uuid:38b9f485-661f-49d1-b8ab-6084dcd4fafd2022-03-26T13:51:43ZGROWTH AND MBMS STUDIES OF REACTION-MECHANISMS FOR INXGA1-XAS CBEConference itemhttp://purl.org/coar/resource_type/c_5794uuid:38b9f485-661f-49d1-b8ab-6084dcd4fafdSymplectic Elements at Oxford1992Singh, NFoord, JSkevington, PDavies, GThe reaction mechanism involved in the growth of InxGa1-xAs lattice matched to InP by chemical beam epitaxy (CBE) was investigated using growth and modulated beam mass spectrometry studies. Emphasis was placed on elucidating how variations in substrate temperature, indium composition and arsenic overpressure influence growth kinetics and how sensitive changes in experimental conditions bring about deviations in the ideal stoichiometry (In0.53Ga0.47As) required for lattice matching to InP. Our observations indicate that the compositional variations in the InGaAs stoichiometry at high temperatures (> 485°C) arise because of the changes in the DEG decomposition: desorption branching ratio which is controlled by a temperature- and arsenic pressure-dependent surface population of indium atoms. The low temperature behaviour is governed by the availability of metal surface sites for triethylgallium decomposition which is increased by the presence of surface indium atoms. © 1992.
spellingShingle Singh, N
Foord, J
Skevington, P
Davies, G
GROWTH AND MBMS STUDIES OF REACTION-MECHANISMS FOR INXGA1-XAS CBE
title GROWTH AND MBMS STUDIES OF REACTION-MECHANISMS FOR INXGA1-XAS CBE
title_full GROWTH AND MBMS STUDIES OF REACTION-MECHANISMS FOR INXGA1-XAS CBE
title_fullStr GROWTH AND MBMS STUDIES OF REACTION-MECHANISMS FOR INXGA1-XAS CBE
title_full_unstemmed GROWTH AND MBMS STUDIES OF REACTION-MECHANISMS FOR INXGA1-XAS CBE
title_short GROWTH AND MBMS STUDIES OF REACTION-MECHANISMS FOR INXGA1-XAS CBE
title_sort growth and mbms studies of reaction mechanisms for inxga1 xas cbe
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AT foordj growthandmbmsstudiesofreactionmechanismsforinxga1xascbe
AT skevingtonp growthandmbmsstudiesofreactionmechanismsforinxga1xascbe
AT daviesg growthandmbmsstudiesofreactionmechanismsforinxga1xascbe