Study of two-photon laser photolithography with SU-8 at cryogenic temperatures
We show that the SU-8 epoxy resist can be exposed by two-photon absorption at 4 K, allowing spectroscopy and lithography to be performed by the same apparatus. We present a systematic study of the exposure parameters. © 2006 Optical Society of America.
| Main Authors: | , , , , , , , |
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| Format: | Journal article |
| Language: | English |
| Published: |
2006
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