Study of two-photon laser photolithography with SU-8 at cryogenic temperatures
We show that the SU-8 epoxy resist can be exposed by two-photon absorption at 4 K, allowing spectroscopy and lithography to be performed by the same apparatus. We present a systematic study of the exposure parameters. © 2006 Optical Society of America.
Sonraí bibleagrafaíochta
| Príomhchruthaitheoirí: |
Lee, K,
Green, A,
Brassard, F,
Taylor, R,
Sharp, D,
Turberfield, A,
Williams, D,
Briggs, G |
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| Formáid: | Journal article
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| Teanga: | English |
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| Foilsithe / Cruthaithe: |
2006
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