Study of two-photon laser photolithography with SU-8 at cryogenic temperatures
We show that the SU-8 epoxy resist can be exposed by two-photon absorption at 4 K, allowing spectroscopy and lithography to be performed by the same apparatus. We present a systematic study of the exposure parameters. © 2006 Optical Society of America.
| Main Authors: | , , , , , , , |
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| Format: | Journal article |
| Language: | English |
| Published: |
2006
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| _version_ | 1797064596531445760 |
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| author | Lee, K Green, A Brassard, F Taylor, R Sharp, D Turberfield, A Williams, D Briggs, G |
| author_facet | Lee, K Green, A Brassard, F Taylor, R Sharp, D Turberfield, A Williams, D Briggs, G |
| author_sort | Lee, K |
| collection | OXFORD |
| description | We show that the SU-8 epoxy resist can be exposed by two-photon absorption at 4 K, allowing spectroscopy and lithography to be performed by the same apparatus. We present a systematic study of the exposure parameters. © 2006 Optical Society of America. |
| first_indexed | 2024-03-06T21:16:38Z |
| format | Journal article |
| id | oxford-uuid:4001301e-cf7f-40ea-b3d5-017ae5ede742 |
| institution | University of Oxford |
| language | English |
| last_indexed | 2024-03-06T21:16:38Z |
| publishDate | 2006 |
| record_format | dspace |
| spelling | oxford-uuid:4001301e-cf7f-40ea-b3d5-017ae5ede7422022-03-26T14:35:23ZStudy of two-photon laser photolithography with SU-8 at cryogenic temperaturesJournal articlehttp://purl.org/coar/resource_type/c_dcae04bcuuid:4001301e-cf7f-40ea-b3d5-017ae5ede742EnglishSymplectic Elements at Oxford2006Lee, KGreen, ABrassard, FTaylor, RSharp, DTurberfield, AWilliams, DBriggs, GWe show that the SU-8 epoxy resist can be exposed by two-photon absorption at 4 K, allowing spectroscopy and lithography to be performed by the same apparatus. We present a systematic study of the exposure parameters. © 2006 Optical Society of America. |
| spellingShingle | Lee, K Green, A Brassard, F Taylor, R Sharp, D Turberfield, A Williams, D Briggs, G Study of two-photon laser photolithography with SU-8 at cryogenic temperatures |
| title | Study of two-photon laser photolithography with SU-8 at cryogenic temperatures |
| title_full | Study of two-photon laser photolithography with SU-8 at cryogenic temperatures |
| title_fullStr | Study of two-photon laser photolithography with SU-8 at cryogenic temperatures |
| title_full_unstemmed | Study of two-photon laser photolithography with SU-8 at cryogenic temperatures |
| title_short | Study of two-photon laser photolithography with SU-8 at cryogenic temperatures |
| title_sort | study of two photon laser photolithography with su 8 at cryogenic temperatures |
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