Near-field phase shift photolithography for high-frequency SAW transducers
Optical lithography has been widely used in mass production of various electronic devices, mainly because of its high throughput capability. However, the resolution in conventional lithography is diffraction limited. Cost issues, on the other hand, make slower but higher resolution methods, like ele...
المؤلفون الرئيسيون: | Hesjedal, T, Seidel, W, Kostial, H |
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التنسيق: | Conference item |
منشور في: |
2002
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مواد مشابهة
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Near-field elastomeric mask photolithography fabrication of high-frequency surface acoustic wave transducers
حسب: Hesjedal, T, وآخرون
منشور في: (2003) -
Parallel scanning near-field photolithography: the Snomipede
حسب: Ul-Haq, Ehtsham, وآخرون
منشور في: (2010) -
Near-field sub-diffraction photolithography with an elastomeric photomask
حسب: Sangyoon Paik, وآخرون
منشور في: (2020-02-01) -
The snomipede : a parallel platform for scanning near-field photolithography.
حسب: Ul-Haq, Ehtsham, وآخرون
منشور في: (2011) -
AFM observation of surface acoustic waves emitted from single symmetric SAW transducers.
حسب: Hesjedal, T, وآخرون
منشور في: (2001)