Near-field phase shift photolithography for high-frequency SAW transducers

Near-field phase shift photolithography for high-frequency SAW transducers

Optical lithography has been widely used in mass production of various electronic devices, mainly because of its high throughput capability. However, the resolution in conventional lithography is diffraction limited. Cost issues, on the other hand, make slower but higher resolution methods, like ele...

Полное описание

Библиографические подробности
Главные авторы:	Hesjedal, T, Seidel, W, Kostial, H
Формат:	Conference item
Опубликовано:	2002

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