Near-field phase shift photolithography for high-frequency SAW transducers

Near-field phase shift photolithography for high-frequency SAW transducers

Optical lithography has been widely used in mass production of various electronic devices, mainly because of its high throughput capability. However, the resolution in conventional lithography is diffraction limited. Cost issues, on the other hand, make slower but higher resolution methods, like ele...

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Chi tiết về thư mục
Những tác giả chính:	Hesjedal, T, Seidel, W, Kostial, H
Định dạng:	Conference item
Được phát hành:	2002

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