Antiferromagnetism in UO2 thin epitaxial films
Thin films (250-4500 Å) of epitaxial UO2 were produced by reactive sputtering on two different substrate materials: LaAlO3 and CaF2. Using the large enhancement present with resonant x-ray scattering using photons at the uranium M4 absorption edge, antiferromagnetic (AF) order was found in all films...
| Main Authors: | , , , , , , , , , , , |
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| Format: | Journal article |
| Language: | English |
| Published: |
2013
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