Microfabrication and characterization of gridded polycrystalline silicon field emitter devices
Uniform arrays of sharp polysilicon held emitters have been fabricated in gridded configuration using state of the art microfabrication techniques including high resolution electron beam lithography and plasma dry etching. Emission currents up to 2.5 mu A/tip have been obtained at a 90 V grid-bias....
| 主要な著者: | , , , |
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| フォーマット: | Conference item |
| 出版事項: |
1998
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