The microstructure and electrical properties of Tl2Ba2Ca1Cu2Ox thin films processed at low temperatures
Tl2Ba2Ca1Cu2Ox thin films on (001) LaAlO3 with excellent alignment suitable for microwave applications at 77 K have been fabricated using an ex situ anneal step in argon atmospheres at temperatures of 720-740°surface resistance values as low as 400 μΩ (79 K, 10 GHz) and large-area critical current d...
| Główni autorzy: | , , , , |
|---|---|
| Format: | Journal article |
| Język: | English |
| Wydane: |
1998
|