Effective antireflection and surface passivation of silicon using a SiO2/a-TiOx film stack
This article reports an effective and industrially relevant passivation and anti-reflection film stack featuring a 10 nm silicon dioxide (SiO2) film followed by a »65 nm amorphous titanium oxide (a-TiOx) film. This film stack has equivalent optical performance to a single-layer silicon nitride (SiNx...
| Main Authors: | , , , , |
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| Format: | Journal article |
| Published: |
IEEE
2017
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