Growth of In(2)O(3)(100) on Y-stabilized ZrO(2)(100) by O-plasma assisted molecular beam epitaxy

Thin films of In2 O3 have been grown on Y-stabilized Zr O2 (100) by oxygen plasma assisted molecular beam epitaxy with a substrate temperature of 650 °C. Ordered epitaxial growth was confirmed by high resolution transmission electron microscopy. The position of the valence band onset in the x-ray ph...

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Main Authors: Bourlange, A, Payne, D, Egdell, R, Foord, J, Edwards, P, Jones, M, Schertel, A, Dobson, P, Hutchison, J
格式: Journal article
语言:English
出版: 2008