Growth of nitrogen doped ZnO films through a nitrogen diffusion process from WN films formed by a cosputtering technique
High quality nitrogen doped ZnO films were fabricated on glass substrates by allowing nitrogen atoms from a pregrown tungsten nitride (WN) to be activated and diffused into a pure ZnO film during an in situ post-thermal annealing process. The N doped ZnO film exhibited reproducible electrical proper...
| Autori principali: | , , , , |
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| Natura: | Journal article |
| Lingua: | English |
| Pubblicazione: |
2008
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