Skip to content
VuFind
English
Deutsch
Español
Français
Italiano
日本語
Nederlands
Português
Português (Brasil)
中文(简体)
中文（繁體）
Türkçe
עברית
Gaeilge
Cymraeg
Ελληνικά
Català
Euskara
Русский
Čeština
Suomi
Svenska
polski
Dansk
slovenščina
اللغة العربية
বাংলা
Galego
Tiếng Việt
Hrvatski
हिंदी
Հայերէն
Українська
Sámegiella
Монгол
Language
All Fields
Title
Author
Subject
Call Number
ISBN/ISSN
Tag
Find
Advanced
SEMICONDUCTOR SURFACE ETCHING...
Cite this
Text this
Email this
Print
Export Record
Export to RefWorks
Export to EndNoteWeb
Export to EndNote
Permanent link
SEMICONDUCTOR SURFACE ETCHING BY HALOGENS - FUNDAMENTAL STEPS
Show other versions (1)
Bibliographic Details
Main Authors:
Jackman, R
,
Price, R
,
Foord, J
Format:
Journal article
Published:
1989
Holdings
Description
Other Versions (1)
Similar Items
Staff View
Showing
1 - 1
results of
1
Show all versions (2)
Search Result 1
Semiconductor surface etching by halogens: Fundamental steps
by
Jackman, R
,
Price, R
,
Foord, J
Published 1989
Journal article
Show all versions (2)
Similar Items
Semiconductor surface etching by halogens: Fundamental steps
by: Jackman, R, et al.
Published: (1989)
REACTION-MECHANISMS FOR THE PHOTON-ENHANCED ETCHING OF SEMICONDUCTORS - AN INVESTIGATION OF THE UV-STIMULATED INTERACTION OF CHLORINE WITH SI(100)
by: Jackman, R, et al.
Published: (1986)
THERMAL AND ION-BEAM-INDUCED ETCHING OF INP WITH CHLORINE
by: Murrell, A, et al.
Published: (1989)
Thermal and ion-beam-induced etching of InP with chlorine
by: Murrell, A, et al.
Published: (1989)
HALOGEN ADSORPTION AND HALOGEN-INDUCED SURFACE PHASE-TRANSITIONS ON CR(110)
by: Foord, J, et al.
Published: (1987)