SEMICONDUCTOR SURFACE ETCHING BY HALOGENS - FUNDAMENTAL STEPS

Podobne zapisy

• Semiconductor surface etching by halogens: Fundamental steps
  od: Jackman, R, i wsp.
  Wydane: (1989)
• REACTION-MECHANISMS FOR THE PHOTON-ENHANCED ETCHING OF SEMICONDUCTORS - AN INVESTIGATION OF THE UV-STIMULATED INTERACTION OF CHLORINE WITH SI(100)
  od: Jackman, R, i wsp.
  Wydane: (1986)
• THERMAL AND ION-BEAM-INDUCED ETCHING OF INP WITH CHLORINE
  od: Murrell, A, i wsp.
  Wydane: (1989)
• Thermal and ion-beam-induced etching of InP with chlorine
  od: Murrell, A, i wsp.
  Wydane: (1989)
• HALOGEN ADSORPTION AND HALOGEN-INDUCED SURFACE PHASE-TRANSITIONS ON CR(110)
  od: Foord, J, i wsp.
  Wydane: (1987)