SEMICONDUCTOR SURFACE ETCHING BY HALOGENS - FUNDAMENTAL STEPS

Eitemau Tebyg

• Semiconductor surface etching by halogens: Fundamental steps
  gan: Jackman, R, et al.
  Cyhoeddwyd: (1989)
• REACTION-MECHANISMS FOR THE PHOTON-ENHANCED ETCHING OF SEMICONDUCTORS - AN INVESTIGATION OF THE UV-STIMULATED INTERACTION OF CHLORINE WITH SI(100)
  gan: Jackman, R, et al.
  Cyhoeddwyd: (1986)
• THERMAL AND ION-BEAM-INDUCED ETCHING OF INP WITH CHLORINE
  gan: Murrell, A, et al.
  Cyhoeddwyd: (1989)
• Thermal and ion-beam-induced etching of InP with chlorine
  gan: Murrell, A, et al.
  Cyhoeddwyd: (1989)
• HALOGEN ADSORPTION AND HALOGEN-INDUCED SURFACE PHASE-TRANSITIONS ON CR(110)
  gan: Foord, J, et al.
  Cyhoeddwyd: (1987)