Jackman, R., Ebert, H., & Foord, J. (1986). REACTION-MECHANISMS FOR THE PHOTON-ENHANCED ETCHING OF SEMICONDUCTORS - AN INVESTIGATION OF THE UV-STIMULATED INTERACTION OF CHLORINE WITH SI(100).
Style de citation Chicago (17e éd.)Jackman, R., H. Ebert, et J. Foord. REACTION-MECHANISMS FOR THE PHOTON-ENHANCED ETCHING OF SEMICONDUCTORS - AN INVESTIGATION OF THE UV-STIMULATED INTERACTION OF CHLORINE WITH SI(100). 1986.
Style de citation MLA (9e éd.)Jackman, R., et al. REACTION-MECHANISMS FOR THE PHOTON-ENHANCED ETCHING OF SEMICONDUCTORS - AN INVESTIGATION OF THE UV-STIMULATED INTERACTION OF CHLORINE WITH SI(100). 1986.
Attention : ces citations peuvent ne pas être correctes à 100%.