REACTION-MECHANISMS FOR THE PHOTON-ENHANCED ETCHING OF SEMICONDUCTORS - AN INVESTIGATION OF THE UV-STIMULATED INTERACTION OF CHLORINE WITH SI(100)

Samankaltaisia teoksia

• THE INTERACTION OF WF6 WITH SI(100) - THERMAL AND PHOTON INDUCED REACTIONS
  Tekijä: Jackman, R, et al.
  Julkaistu: (1988)
• ADSORPTION, ETCHING AND PHOTOINDUCED REACTIONS AT THE SI(100)-CCL4 INTERFACE
  Tekijä: French, C, et al.
  Julkaistu: (1989)
• Adsorption, etching and photo-induced reactions at the Si(100)-CCl 4 interface
  Tekijä: French, C, et al.
  Julkaistu: (1989)
• CHEMICAL PRECURSORS FOR GAAS ETCHING WITH LOW-ENERGY ION-BEAMS - CHLORINE ADSORPTION ON GAAS(100)
  Tekijä: Jackman, R, et al.
  Julkaistu: (1991)
• THERMAL AND ION-BEAM-INDUCED ETCHING OF INP WITH CHLORINE
  Tekijä: Murrell, A, et al.
  Julkaistu: (1989)