REACTION-MECHANISMS FOR THE PHOTON-ENHANCED ETCHING OF SEMICONDUCTORS - AN INVESTIGATION OF THE UV-STIMULATED INTERACTION OF CHLORINE WITH SI(100)

Podobne zapisy

• THE INTERACTION OF WF6 WITH SI(100) - THERMAL AND PHOTON INDUCED REACTIONS
  od: Jackman, R, i wsp.
  Wydane: (1988)
• ADSORPTION, ETCHING AND PHOTOINDUCED REACTIONS AT THE SI(100)-CCL4 INTERFACE
  od: French, C, i wsp.
  Wydane: (1989)
• Adsorption, etching and photo-induced reactions at the Si(100)-CCl 4 interface
  od: French, C, i wsp.
  Wydane: (1989)
• CHEMICAL PRECURSORS FOR GAAS ETCHING WITH LOW-ENERGY ION-BEAMS - CHLORINE ADSORPTION ON GAAS(100)
  od: Jackman, R, i wsp.
  Wydane: (1991)
• THERMAL AND ION-BEAM-INDUCED ETCHING OF INP WITH CHLORINE
  od: Murrell, A, i wsp.
  Wydane: (1989)