Microstructural and microwave characterisation of low temperature processed Tl2Ba2Ca1Cu2Ox thin films
Tl2Ba2Ca1Cu2Ox thin films on LaAlO3 with excellent alignment suitable for the fabrication of passive microwave devices operating at 77K are fabricated using an ex-situ anneal step in argon atmospheres at temperatures of 720 - 740 degrees C, In order to understand the factors influencing their microw...
| Main Authors: | , , , , |
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| Format: | Conference item |
| Published: |
1997
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