Microstructural and microwave characterisation of low temperature processed Tl2Ba2Ca1Cu2Ox thin films
Tl2Ba2Ca1Cu2Ox thin films on LaAlO3 with excellent alignment suitable for the fabrication of passive microwave devices operating at 77K are fabricated using an ex-situ anneal step in argon atmospheres at temperatures of 720 - 740 degrees C, In order to understand the factors influencing their microw...
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| Format: | Conference item |
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1997
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| _version_ | 1797075886927773696 |
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| author | OConnor, J Jenkins, A DewHughes, D Goringe, M Grovenor, C |
| author_facet | OConnor, J Jenkins, A DewHughes, D Goringe, M Grovenor, C |
| author_sort | OConnor, J |
| collection | OXFORD |
| description | Tl2Ba2Ca1Cu2Ox thin films on LaAlO3 with excellent alignment suitable for the fabrication of passive microwave devices operating at 77K are fabricated using an ex-situ anneal step in argon atmospheres at temperatures of 720 - 740 degrees C, In order to understand the factors influencing their microwave and transport properties, the microstructure and compositions of the films have been examined by TEM, HREM and SEM and correlated with the R-s measurements obtained by the partial-end-wall-replacement technique. |
| first_indexed | 2024-03-06T23:56:35Z |
| format | Conference item |
| id | oxford-uuid:746cea09-316a-47a8-8dcb-a18723ac441a |
| institution | University of Oxford |
| last_indexed | 2024-03-06T23:56:35Z |
| publishDate | 1997 |
| record_format | dspace |
| spelling | oxford-uuid:746cea09-316a-47a8-8dcb-a18723ac441a2022-03-26T20:02:48ZMicrostructural and microwave characterisation of low temperature processed Tl2Ba2Ca1Cu2Ox thin filmsConference itemhttp://purl.org/coar/resource_type/c_5794uuid:746cea09-316a-47a8-8dcb-a18723ac441aSymplectic Elements at Oxford1997OConnor, JJenkins, ADewHughes, DGoringe, MGrovenor, CTl2Ba2Ca1Cu2Ox thin films on LaAlO3 with excellent alignment suitable for the fabrication of passive microwave devices operating at 77K are fabricated using an ex-situ anneal step in argon atmospheres at temperatures of 720 - 740 degrees C, In order to understand the factors influencing their microwave and transport properties, the microstructure and compositions of the films have been examined by TEM, HREM and SEM and correlated with the R-s measurements obtained by the partial-end-wall-replacement technique. |
| spellingShingle | OConnor, J Jenkins, A DewHughes, D Goringe, M Grovenor, C Microstructural and microwave characterisation of low temperature processed Tl2Ba2Ca1Cu2Ox thin films |
| title | Microstructural and microwave characterisation of low temperature processed Tl2Ba2Ca1Cu2Ox thin films |
| title_full | Microstructural and microwave characterisation of low temperature processed Tl2Ba2Ca1Cu2Ox thin films |
| title_fullStr | Microstructural and microwave characterisation of low temperature processed Tl2Ba2Ca1Cu2Ox thin films |
| title_full_unstemmed | Microstructural and microwave characterisation of low temperature processed Tl2Ba2Ca1Cu2Ox thin films |
| title_short | Microstructural and microwave characterisation of low temperature processed Tl2Ba2Ca1Cu2Ox thin films |
| title_sort | microstructural and microwave characterisation of low temperature processed tl2ba2ca1cu2ox thin films |
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