Measurement and modeling of Ar/H2CH4 arc jet discharge chemical vapor deposition reactors. I. Intercomparison of derived spatial variations of H atom, C2, and CH radical densities
Comparisons are drawn between spatially resolved absorption spectroscopy data obtained for a 6.4 kW dc arc jet reactor, operating with Ar H2 C H4 gas mixtures, used for deposition of thin, polycrystalline diamond films, and the results of a two-dimensional (r,z) computer model incorporating gas acti...
| Main Authors: | , , , , , , |
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| Format: | Journal article |
| Language: | English |
| Published: |
2007
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