Measurement and modeling of Ar/H2CH4 arc jet discharge chemical vapor deposition reactors. I. Intercomparison of derived spatial variations of H atom, C2, and CH radical densities

Παρόμοια τεκμήρια

• Measurement and modeling of a diamond deposition reactor: Hydrogen atom and electron number densities in an Ar/H 2 arc jet discharge
  ανά: Rennick, C, κ.ά.
  Έκδοση: (2005)
• Spatial profiling of H(n ≤ 2) atom number densities in a dc arc jet reactor
  ανά: Rennick, C, κ.ά.
  Έκδοση: (2006)
• Improved characterisation of C2 and CH radical number density distributions in a DC arc jet used for diamond chemical vapour deposition
  ανά: Rennick, C, κ.ά.
  Έκδοση: (2004)
• Cavity ring-down spectroscopy measurements of the concentrations of C 2(X1Σg +) radicals in a DC arc jet reactor used for chemical vapour deposition of diamond films
  ανά: Rennick, C, κ.ά.
  Έκδοση: (2004)
• Properties of a-C:H films deposited in CH4 H2 and CH4he DC plasma
  ανά: Awang, R., κ.ά.
  Έκδοση: (2009)