Measurement and modeling of Ar/H2CH4 arc jet discharge chemical vapor deposition reactors. I. Intercomparison of derived spatial variations of H atom, C2, and CH radical densities
Comparisons are drawn between spatially resolved absorption spectroscopy data obtained for a 6.4 kW dc arc jet reactor, operating with Ar H2 C H4 gas mixtures, used for deposition of thin, polycrystalline diamond films, and the results of a two-dimensional (r,z) computer model incorporating gas acti...
| Những tác giả chính: | , , , , , , |
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| Định dạng: | Journal article |
| Ngôn ngữ: | English |
| Được phát hành: |
2007
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| _version_ | 1826279371531354112 |
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| author | Rennick, C Ma, J Henney, J Wills, J Ashfold, M Orr-Ewing, A Mankelevich, Y |
| author_facet | Rennick, C Ma, J Henney, J Wills, J Ashfold, M Orr-Ewing, A Mankelevich, Y |
| author_sort | Rennick, C |
| collection | OXFORD |
| description | Comparisons are drawn between spatially resolved absorption spectroscopy data obtained for a 6.4 kW dc arc jet reactor, operating with Ar H2 C H4 gas mixtures, used for deposition of thin, polycrystalline diamond films, and the results of a two-dimensional (r,z) computer model incorporating gas activation, expansion into the low pressure reactor, and the chemistry of the neutral and charged species. The experimental measurements, using either cavity ring-down spectroscopy or diode laser absorption spectroscopy, determined absolute number densities of H (n=2) atoms, and column densities of C2 (a Πu3), C2 (X g+1), and CH (X Π2) radicals, with vibrational and rotational quantum state resolutions, and their variation with height through the horizontally propagating arc jet plume. Spectra were also analyzed to obtain temperatures and local electron densities [from Stark broadening of H (n=2) absorption lines]. The experimental data are directly compared with the output data of the model that returns spatially inhomogeneous temperature, flow velocities, and number densities of 25 neutral and 14 charged species. Under the base operating conditions of the reactor [11.4 SLM (standard liters per minute) of Ar and 1.8 SLM of H2 entering the primary torch, with addition of 80 SCCM (SCCM denotes cubic centimeter per minute at STP) of C H4 downstream; 6.4 kW input power; reactor pressure of 50 Torr], the calculated and measured column and number densities agree to within factors of 2-3, the model reproduces the spatial dependence of column densities, and the mean temperatures of C2 (a) and CH (X) radicals derived from spectra and model results are in good agreement. The model also captures the variation of these parameters with changes to operating conditions of the reactor such as flows of H2 and C H4, and input power. Further details of the model and the insights it provides are the subject of the accompanying paper [Mankelevich, J. Appl. Phys. 102, 063310 (2007)]. © 2007 American Institute of Physics. |
| first_indexed | 2024-03-06T23:57:42Z |
| format | Journal article |
| id | oxford-uuid:74d27ae9-06ae-479d-9c27-193ee13642d2 |
| institution | University of Oxford |
| language | English |
| last_indexed | 2024-03-06T23:57:42Z |
| publishDate | 2007 |
| record_format | dspace |
| spelling | oxford-uuid:74d27ae9-06ae-479d-9c27-193ee13642d22022-03-26T20:05:26ZMeasurement and modeling of Ar/H2CH4 arc jet discharge chemical vapor deposition reactors. I. Intercomparison of derived spatial variations of H atom, C2, and CH radical densitiesJournal articlehttp://purl.org/coar/resource_type/c_dcae04bcuuid:74d27ae9-06ae-479d-9c27-193ee13642d2EnglishSymplectic Elements at Oxford2007Rennick, CMa, JHenney, JWills, JAshfold, MOrr-Ewing, AMankelevich, YComparisons are drawn between spatially resolved absorption spectroscopy data obtained for a 6.4 kW dc arc jet reactor, operating with Ar H2 C H4 gas mixtures, used for deposition of thin, polycrystalline diamond films, and the results of a two-dimensional (r,z) computer model incorporating gas activation, expansion into the low pressure reactor, and the chemistry of the neutral and charged species. The experimental measurements, using either cavity ring-down spectroscopy or diode laser absorption spectroscopy, determined absolute number densities of H (n=2) atoms, and column densities of C2 (a Πu3), C2 (X g+1), and CH (X Π2) radicals, with vibrational and rotational quantum state resolutions, and their variation with height through the horizontally propagating arc jet plume. Spectra were also analyzed to obtain temperatures and local electron densities [from Stark broadening of H (n=2) absorption lines]. The experimental data are directly compared with the output data of the model that returns spatially inhomogeneous temperature, flow velocities, and number densities of 25 neutral and 14 charged species. Under the base operating conditions of the reactor [11.4 SLM (standard liters per minute) of Ar and 1.8 SLM of H2 entering the primary torch, with addition of 80 SCCM (SCCM denotes cubic centimeter per minute at STP) of C H4 downstream; 6.4 kW input power; reactor pressure of 50 Torr], the calculated and measured column and number densities agree to within factors of 2-3, the model reproduces the spatial dependence of column densities, and the mean temperatures of C2 (a) and CH (X) radicals derived from spectra and model results are in good agreement. The model also captures the variation of these parameters with changes to operating conditions of the reactor such as flows of H2 and C H4, and input power. Further details of the model and the insights it provides are the subject of the accompanying paper [Mankelevich, J. Appl. Phys. 102, 063310 (2007)]. © 2007 American Institute of Physics. |
| spellingShingle | Rennick, C Ma, J Henney, J Wills, J Ashfold, M Orr-Ewing, A Mankelevich, Y Measurement and modeling of Ar/H2CH4 arc jet discharge chemical vapor deposition reactors. I. Intercomparison of derived spatial variations of H atom, C2, and CH radical densities |
| title | Measurement and modeling of Ar/H2CH4 arc jet discharge chemical vapor deposition reactors. I. Intercomparison of derived spatial variations of H atom, C2, and CH radical densities |
| title_full | Measurement and modeling of Ar/H2CH4 arc jet discharge chemical vapor deposition reactors. I. Intercomparison of derived spatial variations of H atom, C2, and CH radical densities |
| title_fullStr | Measurement and modeling of Ar/H2CH4 arc jet discharge chemical vapor deposition reactors. I. Intercomparison of derived spatial variations of H atom, C2, and CH radical densities |
| title_full_unstemmed | Measurement and modeling of Ar/H2CH4 arc jet discharge chemical vapor deposition reactors. I. Intercomparison of derived spatial variations of H atom, C2, and CH radical densities |
| title_short | Measurement and modeling of Ar/H2CH4 arc jet discharge chemical vapor deposition reactors. I. Intercomparison of derived spatial variations of H atom, C2, and CH radical densities |
| title_sort | measurement and modeling of ar h2ch4 arc jet discharge chemical vapor deposition reactors i intercomparison of derived spatial variations of h atom c2 and ch radical densities |
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