Simulation of growth of porous SiOx nanostructures
Monte Carlo simulation of deposition of non-stoichiometric amorphous SiOx nanolayers from vapour phase. onto a polymer surface is reported. The model developed is based on the network properties of silica and takes into account dangling bonds arising during the real process of deposition. The model...
Main Authors: | Burlakov, V, Tsukahara, Y, Briggs, G, Sutton, A |
---|---|
Format: | Journal article |
Language: | English |
Published: |
2002
|
Similar Items
-
Simulation of porous SiOx layer growth
by: Burlakov, V, et al.
Published: (2000) -
Monte Carlo simulation of growth of porous SiOx by vapor deposition.
by: Burlakov, V, et al.
Published: (2001) -
How cracks in SiOx-coated polyester films affect gas permeation
by: Yanaka, M, et al.
Published: (2001) -
Nanostructuring the SiOx layers by using laser-induced self-organization
by: O.V. Steblova, et al.
Published: (2017-07-01) -
SiC-SiOx heterojunctions in nanowires
by: Zhu, Y, et al.
Published: (1999)