Cryogenic two-photon laser photolithography with SU-8
We have shown that photolithography can be used to create alignment markers on a semiconductor substrate at cryogenic temperatures. The epoxy resist SU-8 can be exposed effectively by two-photon absorption at a temperature of 4 K. By this means a spectroscopy apparatus can be used to find the positi...
| Main Authors: | , , , , , , , |
|---|---|
| Format: | Journal article |
| Language: | English |
| Published: |
2006
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