Nitridation of nanocrystalline TiO2 thin films by treatment with ammonia
Nanocrystalline anatase (TiO2) thin films prepared by a physical vapour deposition method were nitrided by annealing in flowing NH3 at temperatures ranging between 650 °C and 700 °C. It was established that there was a narrow window of temperatures which allowed both incorporation of interstitial ni...
| Autori principali: | , , , , , |
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| Natura: | Journal article |
| Lingua: | English |
| Pubblicazione: |
2011
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