Residual stress measurement in thin films at sub-micron scale using Focused Ion Beam milling and imaging

Residual stress measurement in thin films at sub-micron scale using Focused Ion Beam milling and imaging

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Detalhes bibliográficos
Principais autores: Song, X, Yeap, K, Zhu, J, Belnoue, J, Sebastiani, M, Bemporad, E, Zeng, K, Korsunsky, A
Formato: Journal article
Publicado em: 2012

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