Near-field elastomeric mask photolithography fabrication of high-frequency surface acoustic wave transducers

Near-field elastomeric mask photolithography fabrication of high-frequency surface acoustic wave transducers

Optical lithography is the method of choice for mass production of electronic as well as acoustic devices. Cost issues, in particular, make it superior over slow but high-resolution methods, such as electron beam lithography. Also, its applicability for nonconductive substrates is an important featu...

Полное описание

Библиографические подробности
Главные авторы:	Hesjedal, T, Seidel, W
Формат:	Journal article
Язык:	English
Опубликовано:	2003

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