THE INTERACTION OF WF6 WITH SI(100) - THERMAL AND PHOTON INDUCED REACTIONS
The thermal and UV photon-induced interaction between WF6 and Si(100) has been examined using AES and thermal desorption mass spectrometry. At 77 K WF6 physisorbs on the silicon surface. Above 150 K dissociative chemisorption phases are formed, which decompose in three distinct stages as the tempera...
| Main Authors: | , |
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| Format: | Journal article |
| Language: | English |
| Published: |
1988
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