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300-KHZ PULSE PLASMA-ETCHING O...
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300-KHZ PULSE PLASMA-ETCHING OF GAAS USING A MIXTURE OF CICH3 AND H2
Bibliographic Details
Main Authors:
Law, V
,
Tewordt, M
,
Clary, D
,
Jones, G
Format:
Conference item
Published:
1993
Holdings
Description
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