EUV sources for the alpha-tools - art. no. 61510Q

In this paper, we report on the recent progress of the Philips Extreme UV source. The Philips source concept is based on a discharge plasma ignited in a Sn vapor plume that is ablated by a laser pulse. Using rotating electrodes covered with a regenerating tin surface, the problems of electrode erosi...

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Bibliographic Details
Main Authors:	Apetz, R, Bergmann, K, Damen, M, Derra, G, Franken, O, Janssen, M, Jonkers, J, Klein, J, Kraus, H, Kruecken, T, List, A, Loeken, M, Mader, A, Metzmacher, C, Neff, W, Probst, S, Pruemmer, R, Rosier, O, Schwabe, S, Seiwert, S, Siemons, G, Vaudrevange, D, Wagemann, D, Weber, A, Zink, P
Format:	Conference item
Published:	2006

EUV sources for the alpha-tools - art. no. 61510Q

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