Non-linear direct-laser-write lithography for semiconductor nanowire characterisation
A non-linear photolithography technique is presented, providing a new, rapid and damage-free method of contacting semiconductor nanowires. In addition, by using nanowires with room-temperature luminescence, a through-resist photoluminescence step provides a verifiable route to contacting high-qualit...
| Main Authors: | , , , , , |
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| Format: | Conference item |
| Published: |
2012
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