Integrating Philips' extreme UV source in the alpha-tools

The paper describes recent progress in the development of the Philips's EUV source. Progress has been realized at many frontiers: Integration studies of the source into a scanner have primarily been studied on the Xe source because it has a high degree of maturity. We report on integration with...

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Bibliographic Details
Main Authors: Pankert, J, Apetz, R, Bergmann, K, Derra, G, Janssen, M, Jonkers, J, Klein, J, Krucken, T, List, A, Loeken, M, Metzmacher, C, Neff, W, Probst, S, Prummer, R, Rosier, O, Seiwert, S, Siemons, G, Vaudrevange, D, Wagemann, D, Weber, A, Zink, P, Zitzen, O
Format: Conference item
Published: 2005