IN-SITU DEPOSITION OF HIGH-TC MATERIALS USING VACUUM-ARC ABLATION WITH MACROPARTICLE FILTER
Main Authors: | Sloggett, G, Mckenzie, D, Cockayne, D, Smith, G, Jenkins, B, Foley, C, Takano, Y, Studer, A, Haub, J, Orr, B |
---|---|
格式: | Conference item |
出版: |
1994
|
相似书籍
-
CATHODIC ARC ABLATION AS A NEW METHOD OF HIGH-TC SUPERCONDUCTOR DEPOSITION
由: Studer, A, et al.
出版: (1992) -
The source of macroparticle-free plasma flows for nanoelectronics
由: Borisenko A. G.
出版: (2013-06-01) -
MICROSCOPICALLY PROPERTIES OF PLASMA WITH CONDUCTIVE MACROPARTICLES
由: F. Baimbetov, et al.
出版: (2010-12-01) -
Life of the dust macroparticles in storage rings
由: S. Heifets, et al.
出版: (2005-06-01) -
Positively Charged Macroparticles in Low-Temperature Plasma
由: Aleksander A. Bizyukov, et al.
出版: (2022-03-01)