Boron-Oxygen Defect Formation Rates and Activity at Elevated Temperatures

In this work the dependence of the slow boron-oxygen defect formation rate on excess carrier density is examined in p-type Cz silicon. In order to examine behavior at elevated temperatures simple models are developed to simulate the injection-level dependent lifetime of samples at a range of tempera...

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Bibliographic Details
Main Authors: Hamer, P, Nampalli, N, Hameiri, Z, Kim, M, Chen, D, Gorman, N, Hallam, B, Abbott, M, Wenham, S
Format: Journal article
Published: Elsevier 2016