SPATIALLY AND TEMPORALLY RESOLVED LASER-INDUCED FLUORESCENCE MEASUREMENTS OF CF2 AND CF RADICALS IN A CF4 RF PLASMA
Laser-induced fluorescence has been used to examine the temporal behavior of ground-state CF2 and CF radicals in a CF4 plasma etching reactor. We also report the measured spatial dependencies of the radical concentrations, and develop a rigorous model for their interpretation. The results indicate t...
| Main Authors: | , , , |
|---|---|
| Format: | Journal article |
| Language: | English |
| Published: |
1989
|