SPATIALLY AND TEMPORALLY RESOLVED LASER-INDUCED FLUORESCENCE MEASUREMENTS OF CF2 AND CF RADICALS IN A CF4 RF PLASMA

Laser-induced fluorescence has been used to examine the temporal behavior of ground-state CF2 and CF radicals in a CF4 plasma etching reactor. We also report the measured spatial dependencies of the radical concentrations, and develop a rigorous model for their interpretation. The results indicate t...

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Những tác giả chính: Booth, J, Hancock, G, Perry, N, Toogood, M
Định dạng: Journal article
Ngôn ngữ:English
Được phát hành: 1989

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