Self-organized amorphous material in silicon(001) by focused ion beam (FIB) system
A method using a focused ion beam (FIB) to prepare a silicon amorphous material is presented. The method involves the redeposition of sputtered material generated during the interaction of the Ga+ ion beam with a silicon substrate material. The shape and dimensions of this amorphous material are sel...
| Main Authors: | , , , , |
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| Format: | Journal article |
| Language: | English |
| Published: |
2005
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