Strain and defect microstructure in ion-irradiated GeSi/Si strained layers as a function of annealing temperature
मुख्य लेखकों: | Glasko, J, Elliman, R, Zou, J, Cockayne, D, Gerald, F |
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स्वरूप: | Journal article |
प्रकाशित: |
1998
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समान संसाधन
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Ion irradiation of GeSi Si strained-layer heterostructures
द्वारा: Glasko, J, और अन्य
प्रकाशित: (1999) -
The effect of irradiation temperature on post-irradiation strain levels in GexSi1-x/Si strained layer heterostructures
द्वारा: Glasko, J, और अन्य
प्रकाशित: (1996) -
The effect of ion-implantation induced defects on strain relaxation in GexSi1-x/Si heterostructures
द्वारा: Glasko, J, और अन्य
प्रकाशित: (1997) -
GeSi strained layers and their applications /
द्वारा: Stoneham, A. M., और अन्य
प्रकाशित: (1995) -
Ge and GeSi electroabsorption modulator arrays via strain and composition engineering
द्वारा: Ma, Danhao.
प्रकाशित: (2021)