GETTERING OF COPPER IN SILICON - PRECIPITATION AT EXTENDED SURFACE-DEFECTS
Selected results from a TEM study of copper precipitation at extended surface defects in silicon are reported. The relative getting effectiveness of surface pits, oxidation induced stacking faults, and their bounding partials is compared. Copper-silicide precipitate colonies on {111} planes are obse...
المؤلفون الرئيسيون: | Decoteau, M, Wilshaw, P, Falster, R |
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التنسيق: | Journal article |
اللغة: | English |
منشور في: |
Publ by Inst of Physics Publ Ltd
1991
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مواد مشابهة
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GETTERING OF COPPER IN SILICON - PRECIPITATION AT EXTENDED SURFACE-DEFECTS
حسب: Decoteau, M, وآخرون
منشور في: (1991) -
GETTERING OF COPPER AND IRON TO EXTENDED SURFACE-DEFECTS IN SILICON
حسب: Decoteau, M, وآخرون
منشور في: (1992) -
PRECIPITATION OF IRON IN SILICON - GETTERING TO EXTENDED SURFACE DEFECT SITES
حسب: Decoteau, M, وآخرون
منشور في: (1991) -
GETTERING OF COPPER TO OXIDATION INDUCED STACKING-FAULTS IN SILICON
حسب: Decoteau, M, وآخرون
منشور في: (1990) -
GETTERING IN SILICON
حسب: Falster, R
منشور في: (1989)