GETTERING OF COPPER IN SILICON - PRECIPITATION AT EXTENDED SURFACE-DEFECTS
Selected results from a TEM study of copper precipitation at extended surface defects in silicon are reported. The relative getting effectiveness of surface pits, oxidation induced stacking faults, and their bounding partials is compared. Copper-silicide precipitate colonies on {111} planes are obse...
Главные авторы: | Decoteau, M, Wilshaw, P, Falster, R |
---|---|
Формат: | Journal article |
Язык: | English |
Опубликовано: |
Publ by Inst of Physics Publ Ltd
1991
|
Схожие документы
-
GETTERING OF COPPER IN SILICON - PRECIPITATION AT EXTENDED SURFACE-DEFECTS
по: Decoteau, M, и др.
Опубликовано: (1991) -
GETTERING OF COPPER AND IRON TO EXTENDED SURFACE-DEFECTS IN SILICON
по: Decoteau, M, и др.
Опубликовано: (1992) -
PRECIPITATION OF IRON IN SILICON - GETTERING TO EXTENDED SURFACE DEFECT SITES
по: Decoteau, M, и др.
Опубликовано: (1991) -
GETTERING OF COPPER TO OXIDATION INDUCED STACKING-FAULTS IN SILICON
по: Decoteau, M, и др.
Опубликовано: (1990) -
GETTERING IN SILICON
по: Falster, R
Опубликовано: (1989)