High vertical yield InP nanowire growth on Si(111) using a thin buffer layer.
We demonstrate the growth of InP nanowires on Si(111) using a thin InP buffer layer. The buffer layer is grown using a two-step procedure. The initial layer formation is ensured by using a very low growth temperature. An extremely high V/III ratio is necessary to prevent In droplet formation at this...
Hlavní autoři: | Fonseka, H, Tan, H, Wong-Leung, J, Kang, J, Parkinson, P, Jagadish, C |
---|---|
Médium: | Journal article |
Jazyk: | English |
Vydáno: |
2013
|
Podobné jednotky
-
Growth of InP nanowires on silicon using a thin buffer layer
Autor: Fonseka, H, a další
Vydáno: (2012) -
Growth of InP nanowires on silicon using a thin buffer layer
Autor: Fonseka, H. Aruni, a další
Vydáno: (2012) -
InP nanowires grown by SA-MOVPE
Autor: Gao, Q, a další
Vydáno: (2012) -
Vertically oriented epitaxial germanium nanowires on silicon substrates using thin germanium buffer layers
Autor: Jung, J, a další
Vydáno: (2010) -
Engineering the Side Facets of Vertical [100] Oriented InP Nanowires for Novel Radial Heterostructures
Autor: H. Aruni Fonseka, a další
Vydáno: (2019-12-01)