Electron-impact-ionization dynamics of SF6
A detailed understanding of the dissociative electron ionization dynamics of SF6 is important in the modeling and tuning of dry-etching plasmas used in the semiconductor manufacture industry. This paper reports a crossed-beam electron ionization velocity-map imaging study on the dissociative ionizat...
| Main Authors: | , , |
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| Format: | Journal article |
| Published: |
American Physical Society
2017
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