Development, theory and application of the reflection confocal scanning infra-red microscope
<p>Czochralski (Cz) silicon wafers are used almost exclusively for the fabrication of VLSI devices. Such silicon contains excess oxygen which precipitates as oxide particles either when the initial ingot is grown or subsequently during the wafer device fabrication. Such oxide particles can pr...
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| Format: | Thesis |
| Language: | English |
| Published: |
1994
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| Subjects: |