Dielectric effect of a thin SiO2 interlayer at the interface between silicon and high-k oxides
| Main Authors: | , , |
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| Format: | Conference item |
| Published: |
2004
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| _version_ | 1797096298332028928 |
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| author | Giustino, F Umari, P Pasquarello, A |
| author_facet | Giustino, F Umari, P Pasquarello, A |
| author_sort | Giustino, F |
| collection | OXFORD |
| description | |
| first_indexed | 2024-03-07T04:39:54Z |
| format | Conference item |
| id | oxford-uuid:d13fa4dd-6ba5-426d-abd8-9f96becad38e |
| institution | University of Oxford |
| last_indexed | 2024-03-07T04:39:54Z |
| publishDate | 2004 |
| record_format | dspace |
| spelling | oxford-uuid:d13fa4dd-6ba5-426d-abd8-9f96becad38e2022-03-27T07:55:48ZDielectric effect of a thin SiO2 interlayer at the interface between silicon and high-k oxidesConference itemhttp://purl.org/coar/resource_type/c_5794uuid:d13fa4dd-6ba5-426d-abd8-9f96becad38eSymplectic Elements at Oxford2004Giustino, FUmari, PPasquarello, A |
| spellingShingle | Giustino, F Umari, P Pasquarello, A Dielectric effect of a thin SiO2 interlayer at the interface between silicon and high-k oxides |
| title | Dielectric effect of a thin SiO2 interlayer at the interface between silicon and high-k oxides |
| title_full | Dielectric effect of a thin SiO2 interlayer at the interface between silicon and high-k oxides |
| title_fullStr | Dielectric effect of a thin SiO2 interlayer at the interface between silicon and high-k oxides |
| title_full_unstemmed | Dielectric effect of a thin SiO2 interlayer at the interface between silicon and high-k oxides |
| title_short | Dielectric effect of a thin SiO2 interlayer at the interface between silicon and high-k oxides |
| title_sort | dielectric effect of a thin sio2 interlayer at the interface between silicon and high k oxides |
| work_keys_str_mv | AT giustinof dielectriceffectofathinsio2interlayerattheinterfacebetweensiliconandhighkoxides AT umarip dielectriceffectofathinsio2interlayerattheinterfacebetweensiliconandhighkoxides AT pasquarelloa dielectriceffectofathinsio2interlayerattheinterfacebetweensiliconandhighkoxides |