Dielectric effect of a thin SiO2 interlayer at the interface between silicon and high-k oxides

Liknande verk

• Electronic and dielectric properties of a suboxide interlayer at the silicon-oxide interface in MOS devices
  av: Giustino, F, et al.
  Publicerad: (2005)
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  av: Giustino, F, et al.
  Publicerad: (2003)
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  av: Giustino, F, et al.
  Publicerad: (2005)
• Atomistic models of the Si(100)-SiO(2) interface: structural, electronic and dielectric properties
  av: Giustino, F, et al.
  Publicerad: (2005)
• Atomic-scale investigation of the dielectric screening at the interface between silicon and its oxide
  av: Giustino, F, et al.
  Publicerad: (2004)