Thermal and ion-beam-induced etching of InP with chlorine
Surface spectroscopic techniques have been used to investigate adsorption and thermal and ion-induced processes at the InP(100)-Cl2 interface. Two adsorption states are identified and etching reactions are interpreted in terms of surface chemical transformations and desorption processes involving th...
| Main Authors: | , , , |
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| Format: | Journal article |
| Language: | English |
| Published: |
1989
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