The properties of nitrogen and oxygen in silicon

A novel dislocation locking technique is used to study the behaviour of nitrogen and oxygen in silicon. Specimens containing well-defined arrays of dislocation half-loops are subjected to isothermal anneals of controlled duration, during which nitrogen or oxygen diffuses to the dislocations. The str...

Descrizione completa

Dettagli Bibliografici
Autori principali: Murphy, J, John Douglas Murphy
Altri autori: Wilshaw, P
Natura: Tesi
Lingua:English
Pubblicazione: 2006
Soggetti: