Oligomeric aminoborane precursors for the chemical vapour deposition growth of few-layer hexagonal boron nitride

We explore the use of stable, pre-formed, oligomeric aminoboranes as precursors for the chemical vapour deposition growth of few-layered hexagonal boron nitride (h-BN) films on Cu foils under atmospheric pressure conditions. Dimeric diborazane H3B·NH2BH2·NH3 (DAB), and trimeric triborazane H3B·(NH2B...

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Bibliographic Details
Main Authors:	Wang, X, Hooper, T, Kumar, A, Priest, I, Sheng, Y, Samuels, T, Wang, S, Robertson, A, Pacios, M, Bhaskaran, H, Weller, A, Warner, J
Format:	Journal article
Published:	Royal Society of Chemistry 2016

Oligomeric aminoborane precursors for the chemical vapour deposition growth of few-layer hexagonal boron nitride

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